Nuclear Science and Techniques

《核技术》(英文版) ISSN 1001-8042 CN 31-1559/TL     2019 Impact factor 1.556

Nuclear Science and Techniques ›› 2015, Vol. 26 ›› Issue (3): 030507 doi: 10.13538/j.1001-8042/nst.26.030507


TiO2 nanofilm growth by Ti ion implantation and thermal annealing in O2 atmosphere

ZHOU Xiao-Dong, ZHOU Si-Hua, SUN Xian-Ke, and ZHANG Yun-Li   

  1. School of Physics and Electromechnical Engineering, Zhoukou Normal University, Zhoukou 466001, China
  • Contact: ZHOU Xiao-Dong
  • Supported by:

    Supported by National Natural Science Foundation of China (No. 11405280), Foundation from Education Department of Henan Province (No. 14B140021) and the Startup Foundation for Doctors of Zhoukou Normal University (No. zksybscx201210)

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ZHOU Xiao-Dong, ZHOU Si-Hua, SUN Xian-Ke, and ZHANG Yun-Li. TiO2 nanofilm growth by Ti ion implantation and thermal annealing in O2 atmosphere.Nuclear Science and Techniques, 2015, 26(3): 030507     doi: 10.13538/j.1001-8042/nst.26.030507


TiO2 nanofilms on surface of fused silica were fabricated by Ti ion implantation and subsequent thermal annealing in oxygen ambience. The silica glasses were implanted by 20 kV Ti ions to 1.5 ×1017 ions/cm2 on an implanter of metal vapor vacuum arc (MEVVA) ion source. Effects of annealing parameters on formation, growth and phase transformation of the TiO2 nanofilms were studied in detail. Optical absorption spectroscopy, Raman scattering spectroscopy, X-ray photoelectron spectroscopy, scanning electron microscopy and transmission electron microscopy measurements were done to figure out formation mechanism of the TiO2 nanofilms. The formation of TiO2 nanofilms was due to out-diffusion of the implanted Ti ions to the substrate surface, where they were oxidized into TiO2 nanoparticles. Formation, phase, and thickness of the TiO2 nanofilms can be well tailored by controlling annealing parameters.

Key words: Ion implantation, Thermal annealing, TiO2 nanofilms, Characterization