Nuclear Science and Techniques

《核技术》(英文版) ISSN 1001-8042 CN 31-1559/TL     2019 Impact factor 1.556

Nuclear Science and Techniques ›› 1995, Vol. 6 ›› Issue (3): 150

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DEPTH PROFILING OF DEUTERIUM IN Al2O3

Tan Xiaohua (谈效华)1, Luo Siwei (罗四维)1, Song Zheming (宋哲明)1, Lai Zuwu (赖祖武)2, Zhao Guoqing (赵国庆)3, Zhou Zhuying (周筑颖)3   

  1. 1 Institute of Applied Electronics of CAEP, Chengdu 610003;
    2 Graduate School of China Academy of Engineering Physics 1 CAEP, Beijing 100088;
    3 Department of Nuclear Science, Fudan University, Shanghai 200433
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Tan Xiaohua (谈效华), Luo Siwei (罗四维), Song Zheming (宋哲明), Lai Zuwu (赖祖武), Zhao Guoqing (赵国庆), Zhou Zhuying (周筑颖). DEPTH PROFILING OF DEUTERIUM IN Al2O3.Nuclear Science and Techniques, 1995, 6(3): 150

Abstract: Dj ions of 70 and 90 keV were separately implanted into two thick samples of sintered alumina ceramic and the distribution of deuterium has been measured for three runs at an interval of 5 months using high energy proton backscattering and elastic recoil detection (ERD). The measured data show that there is little diffusion of deuterium in Al2O3 and the diffusion coefficient is deduced to be 1.1x10-17 cm2/s. The measured total concentration of implanted deuterium is 4.5x1018 at./cm2. The profile of hydrogen adsorbed on the surface of Al2O3 samples was also observed by ERD and 1H(19F, αγ)16O analysis. The distribution range of 1H in Al2O3 after deuterium implantation is much larger than that before one.

Key words: Depth profiling, Diffusion coefficient, Deuterium, Ceramic