Nuclear Science and Techniques

《核技术》(英文版) ISSN 1001-8042 CN 31-1559/TL     2019 Impact factor 1.556

Nuclear Science and Techniques ›› 1992, Vol. 3 ›› Issue (2): 89

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CEMS AND COUPLING EFFECT OF INTERLAYERS IN MULTILAYERED FeSi/Si AMORPHOUS FILMS

Ma Xiaoding (马小丁) Liu Yihua (刘宜华) and Mei Liangmo (梅良模)   

  1. Shandong University, Jinan 250100, China
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Ma Xiaoding (马小丁) Liu Yihua (刘宜华) and Mei Liangmo (梅良模). CEMS AND COUPLING EFFECT OF INTERLAYERS IN MULTILAYERED FeSi/Si AMORPHOUS FILMS.Nuclear Science and Techniques, 1992, 3(2): 89

Abstract: Multilayered FeSi/Si amorphous films with fixed FeSi layer thickness and different Si layer thicknesses have been studied by conversion electron Mössbauer spectroscopy at room temperature. The results showed that with decreasing the Si layer thickness, the hyperfine field of samples increased and the thickness of interface dead layers arisen from the atomic interdiffusion effect decreased. These are due to the coupling effect between the magnetic layers. When the Si layers are thinner than 0.88 nm, the direction of the magnetization is out of the film plane.

Key words: Multilayered films, Dead layers, Coupling between the magnetic layers, Conversion electron, M?ssbauer spectroscopy