Nuclear Science and Techniques

《核技术》(英文版) ISSN 1001-8042 CN 31-1559/TL     2019 Impact factor 1.556

Nuclear Science and Techniques ›› 2008, Vol. 19 ›› Issue (3): 174 doi: 10.1016/S1001-8042(08)60046-9


Microscopic model for chemical etchability along radiation damage paths in solids

Mukhtar Ahmed RANA   

  1. Physics Division, Directorate of Science, PINSTECH, P.O. Nilore, Islamabad, Pakistan
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Mukhtar Ahmed RANA. Microscopic model for chemical etchability along radiation damage paths in solids.Nuclear Science and Techniques, 2008, 19(3): 174     doi: 10.1016/S1001-8042(08)60046-9

Abstract: It would be very interesting to develop a picture about removal of atoms from the radiation damaged paths or latent nuclear tracks and undamaged bulk material in track detectors. Here, theory of chemical etching is described briefly and a new model for chemical etching along radiation damaged paths in solids is developed based on basic scientific facts and valid assumptions. Dependence of chemical etching on radiation damage intensity and etching conditions is discussed. A new parameter for etching along radiation damaged paths is introduced, which is useful for investigation of relationship between chemical etchability and radiation damage in a solid. Results and discussion presented here are also useful for further development of nuclear waste immobilization.

Key words: Radiation damage, Chemical etchability, Fission fragments, Nuclear track detection technique, Nuclear waste immobilization, Nanofabrication