Nuclear Science and Techniques

《核技术》(英文版) ISSN 1001-8042 CN 31-1559/TL     2019 Impact factor 1.556

Nuclear Science and Techniques ›› 2006, Vol. 17 ›› Issue (3): 135 doi: 10.1016/S1001-8042(06)60026-2

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A cathodic arc enhanced middle-frequency magnetron sputter system for deposition of hard protective coatings

HUANG Zhi-Hong YANG Bing FAN Xiang-Jun FU De-Jun*   

  1. Accelerator Laboratory, Department of Physics, Wuhan University, Wuhan 430072, China
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HUANG Zhi-Hong YANG Bing FAN Xiang-Jun FU De-Jun. A cathodic arc enhanced middle-frequency magnetron sputter system for deposition of hard protective coatings.Nuclear Science and Techniques, 2006, 17(3): 135     doi: 10.1016/S1001-8042(06)60026-2
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Abstract: A new cathode arc enhanced magnetron sputter system for deposition of hard protective coatings is re-ported in this article. This system consists of eight targets: four outer targets are mounted on the wall of the chamber and four inner targets are placed around the center of the chamber. The outer and inner targets form four pair targets and are powered by four middle frequency power supplies. One of the outer targets can run either in the cathode arc mode or in the magnetron sputter mode. The Ti-containing diamond-like carbon nanocomposite coatings were depos-ited by using this system. The prepared coating exhibits high hardness (~20GPa), good adhesion (critical load is 50 N), very low friction coefficient (~0.07), and excellent tribological performance with a wear rate of 1.4×10-16 m3·N-1·m-1.

Key words: Cathodic arc, Middle frequency magnetron sputtering, Diamond-like carbon.