# Nuclear Science and Techniques

《核技术》(英文版) ISSN 1001-8042 CN 31-1559/TL     2019 Impact factor 1.556

Nuclear Science and Techniques ›› 2019, Vol. 30 ›› Issue (7): 107

• ACCELERATOR, RAY AND APPLICATIONS •

### Effect of sputtering power and annealing on surface roughness of gold films for high-reflectivity synchrotron radiation mirrors

Jia-Qi Chen, Qiu-Shi Huang, Run-Ze Qi, Yu-Fei Feng, Jiang-Tao Feng, Zhong Zhang, Wen-Bin Li, Zhan-Shan Wang

1. MOE Key Laboratory of Advanced Micro-Structured Materials, Institute of Precision Optical Engineering (IPOE), School of Physics Science and Engineering, Tongji University, Shanghai, 200092, China
• Received:2019-01-03 Revised:2019-03-22 Accepted:2019-03-31
• Contact: Zhan-Shan Wang E-mail:wangzs@tongji.edu.cn
• Supported by:
This work was supported by the National Key R&D Program of China (Nos. 2016YFA0401304 and 2017YFA0403302) and the National Natural Science Foundation of China (NSFC) (Nos. 61621001, 11505129, and U1732268).
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Jia-Qi Chen, Qiu-Shi Huang, Run-Ze Qi, Yu-Fei Feng, Jiang-Tao Feng, Zhong Zhang, Wen-Bin Li, Zhan-Shan Wang. Effect of sputtering power and annealing on surface roughness of gold films for high-reflectivity synchrotron radiation mirrors.Nuclear Science and Techniques, 2019, 30(7): 107
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Abstract: Gold films deposited by direct current magnetron sputtering are used for synchrotron radiation optics. In this study, the microstructure and surface roughness of gold films were investigated for the purpose of developing high reflectivity mirrors. The deposition process was first optimized. Films were fabricated at different sputtering powers (15, 40, 80, and 120 W) and characterized using grazing incidence X-ray reflectometry, X-ray diffraction, and atomic force microscopy. The results showed that all the films were highly textured, having a dominant Au (111) orientation, and the film deposited at 80 W had the lowest surface roughness. Subsequently, post-deposition annealing from 100 to 200 °C in a vacuum was performed on the ﬁlms deposited at 80 W to investigate the effect of annealing on the microstructure and surface roughness of the ﬁlms. The grain size, surface roughness, and their relationship were investigated as a function of annealing temperature. AFM and XRD results revealed that at annealing temperatures of 175 °C and below, microstructural change of the films was mainly manifested by the elimination of voids. At annealing temperatures higher than 175 °C, grain coalescence occurred in addition to the void elimination, causing the surface roughness to increase.