Nuclear Science and Techniques

《核技术》(英文版) ISSN 1001-8042 CN 31-1559/TL     2019 Impact factor 1.556

Nuclear Science and Techniques ›› 2017, Vol. 28 ›› Issue (9): 127 doi: 10.1007/s41365-017-0274-z


Cleaning of carbon-contaminated optics using O2/Ar plasma

Yi-Fei Zhang1  Hong-Xin Luo 1 Zhi Guo1 Xiang-Jun Zhen  1 Ming Chen 1 Jun-Nan Liu 1   

  1. 1 Shanghai Institute of Applied Physics, Chinese Academy of Sciences, Shanghai 201204, China
  • Contact: Hong-Xin Luo
  • Supported by:

    This work was supported by the Maintenance and Renovation Project of Large Scale Scientific Facility, Chinese Academy of Sciences.

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Yi-Fei Zhang, Hong-Xin Luo, Zhi Guo, Xiang-Jun Zhen, Ming Chen, Jun-Nan Liu. Cleaning of carbon-contaminated optics using O2/Ar plasma.Nuclear Science and Techniques, 2017, 28(9): 127     doi: 10.1007/s41365-017-0274-z


Cleaning of carbon-contaminated beamline optics was studied by RF plasma discharge process using O2/Ar. Carbon-coated samples were prepared, and through their cleaning processes key parameters were determined, such as the optimal RF output power, mixing rates of O2/Ar, and chamber vacuum. Considerations were made against possible adverse effects in cleaning the beamline optics, such as comparing the roughness of samples before and after cleaning, and possible detrimental kinetic effects on cable insulation. Under the cleaning parameters to clean the beamline optics, the thickness of removed carbon film and the change in beamline photon flux were analyzed.

Key words: RF plasma cleaning, Carbon-coated samples, Roughness Cable’s conductivity, Beamline photon flux