基于法线追迹原理的新型高精度面形检测系统

doi:10.11889/j.0253-3219.2017.hjs.40.090101

Nuclear Techniques

• SYNCHROTRON RADIATION TECHNOLOGY AND APPLICATIONS • Next Articles

A novel high-accuracy deflectometric profiler system based on normal tracing principle

PENG Chuanqian^1,2,3, HE Yumei¹, WANG Jie¹

1. Shanghai Institute of Applied Physics, Chinese Academy of Sciences, Jiading Campus, Shanghai 201800, China;
2. University of Chinese Academy of Sciences, Beijing 100049, China;
3. Chongqing University of Technology, Chongqing 400054, China

Received:2017-01-18 Revised:2017-04-03 Online:2017-09-10 Published:2017-09-06
Supported by:
Supported by National Natural Science Foundation of China (No.11179005, No.11675253), State Key R&D Program of China (No.2016YFA0401303)

Abstract

Abstract:

Background: High accuracy profile metrology systems are important instruments for the metrology of X-ray mirrors used in many areas like synchrotron facilities and telescopes. Many systematic errors introduced by manufacture defects of optical elements of these metrology systems will affect its performance. Purpose: This study aims to design a novel high-accuracy deflectometric profiler system to meet the state-of-art high-accuracy metrology requirement of 3rd generation X-ray light sources and X-ray free electron lasers. Methods: A new type of deflectometric profiler system, based on normal tracing principle, was proposed in which a pinhole and a light source are used to make a beam select system to automatically select a beam which propagates along the normal direction of the measured area on the surface under test. The profile information of the surface under test could be measured by measuring the angle variation of the selected beam. Results: Systematic errors introduced by manufacture defects of optical elements could be minimized by placing these optical elements as close as possible to the pinhole. Conclusion: By using the normal tracing principle method, high accuracy metrology for strong curved mirror is possible.

Key words: Normal tracing principle, Manufacture defects, Inhomogeneity, Deflectometric profiler system, Synchrotron facility

CLC Number:

TL99

PENG Chuanqian, HE Yumei, WANG Jie. A novel high-accuracy deflectometric profiler system based on normal tracing principle[J].Nuclear Techniques, 2017, 40(9): 90101-090101.

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A novel high-accuracy deflectometric profiler system based on normal tracing principle

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