Nuclear Techniques ›› 2016, Vol. 39 ›› Issue (12): 120203-120203.doi: 10.11889/j.0253-3219.2016.hjs.39.120203

• LOW ENERGY ACCELERATOR, RAY AND APPLICATIONS • Previous Articles     Next Articles

A new method for calculation of energy deposition profile of intense pulsed electron beam

LIU Xue1, RAN Xianwen1,2, XU Zhihong1, WANG Bo1, TANG Wenhui1   

  1. 1 Institute of Engineering Physics, College of Science, National University of Defense Technology, Changsha 410073, China;
    2 Institutes of Technology of Changsha, Monitoring and Modeling of Electromagnetic Environment in Near Space Key Laboratory of General Colleges and Universities of Hunan Province, Changsha 410073, China
  • Received:2016-06-17 Revised:2016-10-27 Online:2016-12-10 Published:2016-12-10
  • Supported by:

    Supported by National Natural Science Foundation of China (No.11002162), Weapon Equipment Development Project (No.51311020201), Project of Changsha University of Science and Technology, Near Space Electromagnetic Environment Monitoring and Modeling Key Laboratory of Hunan Province (No.20150104)

Abstract:

Background: In an electron beam experiment, electrons accelerated in electromagnetic field have different kinds of velocities and angles. However, in early numerical simulation calculations, the electron beam is always supposed to perpendicularly hit the surface of target materials, which will cause biases between simulations and experiments. Purpose: In this paper, a new method has been given to calculate energy deposition profile of intense pulsed electron beam which may explain the biases. Methods: MCNP (Monte Carlo N Particle Transport Code) is used to study metals such as aluminum, cuprum and tantalum. The differences between electron beam perpendicular to material and the one with angle distribution were worked out. Results: The results show that the energy deposition peak of pulsed electron beam with angular distribution is smaller than that of electron beam which is perpendicular. Conclusion: This may explain the biases between simulations and experiments.

Key words: Pulsed electron beam, Electron beam angle of divergence, Energy deposition profile, Simulation

CLC Number: 

  • TL7